toutamvk@nplindia.org

Dr. Vijay Kr. Toutam
Designation:
Sr. Scientist
Department:
Nanoscale Measurements
Email address:
toutamvk@nplindia.org
Brief Biodata:

DP/DU No. and Name: Quantum Phenomena & Applications (6.03)

Name :  Dr. Vijaykumar Toutam

Current position and Address

Scientist, Cabin 3, Old Stores, Near HEPP Building
National Physical Laboratory, Dr. K. S. Krishnan Road 
New Delhi-110012, ( INDIA )

Educational Qualifications: M Sc, Ph D

Degree/ Certificate

Name of University/Board

Subject

year

Ph.D

JNCASR Bangalore

Nanoscience

2008

M.Sc

University of Hyderabad

Material Science

2003

B.Sc

Kakatiya University

Maths, Physics, Comp Sci

2000

Academics/Research Experience:

Period

Designation

Place of Employment

2011 - Present

Scientist

CSIR - NPL

2010 - 2011

Scientist fellow

CSIR - NPL

2009 - 2010

Research Associate

Pennsylvania State University.

2004

Project Fellow

CNR - INFM, TASC, Trieste, Italy

Date of Joining NPL: 19/12/2011

Recent Publications:

  • Kriti Tyagi ,   Bhasker Gahtori ,   Sivaiah Bathula ,   Vijaykumar Toutam ,   Sakshi Sharma ,   Niraj Kumar Singh  and   Ajay Dhar , ” Thermoelectric and mechanical properties of spark plasma sintered Cu 3 SbSe 3   and Cu 3 SbSe 4 : Promising thermoelectric materials ” , Appl. Phys. Lett.   105 , 261902   (2014).
  • Pramod Kumar, Anjana Dogra, Vijaykumar Toutam,” Pin hole mediated electrical transport across LaTiO3/SrTiO3 and LaAlO3/SrTiO3 oxide hetero-structures ” Appl. Phys. Lett, 103 , 211601   (2013) .
  • Vijaykumar Toutam, H. Pandey, R. C. Budhani, “ Formation of double ring patterns on Co 2 MnSi Heusler alloy thin film by anodic oxidation under scanning probe microscope”, AIP Advances, 3, 022124 (2013).
  • B.R. Chakraborty, S.K. Halder, K.K. Maurya, A.K. Srivastava, V.K. Toutam, M.K. Dalai, G. Sehgal, S. Singh, “ Evaluation of depth distribution and characterization of nanoscale Ta/Si multilayer thin film structures ”, Thin Solid Films, 520, 20, 6409 (2012).
  • T. Vijayakumar, K. Narendra and G.U. Kulkarni, “ Electron Beam Induced Carbonaceous Deposition as a Local Dielectric for CNT Circuits” , Inter. J. Nanosci.,  10 , 935 (2011) .
  • T. Vijaykumar, Narendra Kurra and G. U. Kulkarni “CNT Manipulation: Inserting a Carbonaceous Dielectric Layer Beneath Using Electron Beam Induced Deposition”, J. Nanosci. Nanotech, 11, 1025, (2011) .
  • P. Joshi1, H. E. Romero, A T Neal, V. K. Toutam, and S. A. Tadigadapa “Intrinsic Doping and Gate Hysteresis in Graphene Field Effect Devices fabricated on SiO2 substrates”, J. Phys.: Condens. Matter 22 , 33421 (2010) .

Conference Proceedings:

  • P Joshi, V Toutam, S Tadigadapa, A Neal, H Gutierrez ,” Effect of SiO2 surface treatment on graphene transistors fabricated on Si: SiO2 substrates using a lithography free process ”, APS Meeting Abstracts 1, 21008, 2010
  • T. Vijaykumar, G. U. Kulkarni , Tomaz Mlakar, Georgio Biasiol, Lucia Sorba & Stefan Heun Conducting Atomic Force Microscopy and Electric Force Microscopy of InAs / GaAs Quantum rings” ICONSAT - 2008, Chennai Trade Centre, Chennai, India.
  • T. Vijaykumar, G. U. Kulkarni, “ Electrostatic nanolithography on PVP films for patterning metal nanocrystals and fullerenes”, The 10 th international Conference on Advanced Materials, (IUMRS-ICAM, 2007), Bangalore, India
  • T. Vijaykumar, G. U. Kulkarni, “ A One step Synthesis of Impurity free Metal Nanoparticles”, ICONSAT – 2006, ITC, Delhi, India .

Current Activity : Growth of heterostructures using lithography, wet chemistry and study of their quantum phenomena at interfaces for potential devices. ‘ Quantum phenomena at interfaces' is a very active subject of research and has potential applications in memory storage, sensors, amplifiers and resonators. It also has tremendous potential for metrology and developing standards. Our group is looking into aspects of characterizing these phenomena and device fabrication using lithographic techniques.

Blood Group:  O+

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